Optimization of ion implantation damage annealing by means...

Thin Solid Films 1993 Vol. 235; Iss. 1-2

Optimization of ion implantation damage annealing by means of high-resolution X-ray diffraction

J.G.E. Klappe, I. Bársony, J.R. Liefting, T.W. Ryan
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Volume:
235
Year:
1993
Language:
english
Pages:
9
DOI:
10.1016/0040-6090(93)90264-p
File:
PDF, 1.28 MB
english, 1993
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