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The role of the buffer gas in the ArF laser chemical vapour deposition of silicon oxide
P. González, J. Pou, D. Fernández, E. García, J. Serra, B. León, M. Pérez-AmorVolume:
230
Year:
1993
Language:
english
Pages:
4
DOI:
10.1016/0040-6090(93)90343-n
File:
PDF, 275 KB
english, 1993