Influence of low energy ion bombardment on the properties...

Thin Solid Films 1994 Vol. 237; Iss. 1-2

Influence of low energy ion bombardment on the properties of TiN films deposited by r.f. magnetron sputtering

P.Y. Jouan, G. Lempérière
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Volume:
237
Year:
1994
Language:
english
Pages:
8
DOI:
10.1016/0040-6090(94)90261-5
File:
PDF, 480 KB
english, 1994
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