SF6 sensitized CO2-laser chemical vapor deposition of a-Ge:H
M. Barth, P. Hess, G. Mollekopf, H. StafastVolume:
241
Year:
1994
Language:
english
Pages:
6
DOI:
10.1016/0040-6090(94)90397-2
File:
PDF, 512 KB
english, 1994