Ion beam induced chemical vapor deposition for the preparation of thin film oxides
D. Leinen, A. Fernández, J.P. Espinós, T.R. Belderrain, A.R. González-ElipeVolume:
241
Year:
1994
Language:
english
Pages:
4
DOI:
10.1016/0040-6090(94)90425-1
File:
PDF, 290 KB
english, 1994