Dependence of the a-Si:H defect density of states on the...

Thin Solid Films 1994 Vol. 240; Iss. 1-2

Dependence of the a-Si:H defect density of states on the magnetic field profile of an electron cyclotron resonance microwave plasma

F.S Pool, J.M Essick, Y.H Shing, R.T Mather
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Volume:
240
Year:
1994
Language:
english
Pages:
5
DOI:
10.1016/0040-6090(94)90713-7
File:
PDF, 401 KB
english, 1994
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