Chemical etching of ion beam deposited AlN and AlN:H

Thin Solid Films 1996 Vol. 279; Iss. 1-2

Chemical etching of ion beam deposited AlN and AlN:H

L. Huang, Xiao-Dong Wang, K.W. Hipps, Ursula Mazur, R. Heffron, J.T. Dickinson
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Volume:
279
Year:
1996
Language:
english
Pages:
6
DOI:
10.1016/0040-6090(95)08129-1
File:
PDF, 723 KB
english, 1996
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