Characteristics of the thermal oxidation of heavily...

Characteristics of the thermal oxidation of heavily boron-doped polycrystalline silicon thin films

M. Boukezzata, D. Bielle-Daspet, G. Sarrabayrouse, F. Mansour
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Volume:
279
Year:
1996
Language:
english
Pages:
10
DOI:
10.1016/0040-6090(95)08172-0
File:
PDF, 1.37 MB
english, 1996
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