Ultrathin silicon oxide films deposited by synchrotron...

Thin Solid Films 1996 Vol. 280; Iss. 1-2

Ultrathin silicon oxide films deposited by synchrotron irradiation of condensed layers of silanes and water

J.F. Moore, D.R. Strongin
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Volume:
280
Year:
1996
Language:
english
Pages:
6
DOI:
10.1016/0040-6090(95)08177-1
File:
PDF, 803 KB
english, 1996
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