SiC thin film preparation by ArF excimer laser chemical vapor deposition Part 1: Rate of photolysis of alkylsilanes by ArF excimer laser and their decomposition products
Akio Watanabe, Kazuo Osato, Shinji Ninomiya, Masakazu Mukaida, Tatsuo Tsunoda, Yoji ImaiVolume:
274
Year:
1996
Language:
english
Pages:
6
DOI:
10.1016/0040-6090(95)08186-0
File:
PDF, 647 KB
english, 1996