Effect of N2O/SiH4 ratio on the properties of low-temperature silicon oxide films from remote plasma chemical vapour deposition
Young-Bae Park, Jin-Kyu Kang, Shi-Woo RheeVolume:
280
Year:
1996
Language:
english
Pages:
8
DOI:
10.1016/0040-6090(95)08191-7
File:
PDF, 2.30 MB
english, 1996