[IEEE 2020 IEEE Symposium on VLSI Technology - Honolulu,...

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[IEEE 2020 IEEE Symposium on VLSI Technology - Honolulu, HI, USA (2020.6.16-2020.6.19)] 2020 IEEE Symposium on VLSI Technology - Improved Air Spacer Co-Integrated with Self-Aligned Contact (SAC) and Contact Over Active Gate (COAG) for Highly Scaled CMOS Technology

Cheng, Kangguo, Park, Chanro, Wu, Heng, Li, Juntao, Nguyen, Son, Zhang, Jingyun, Wang, Miaomiao, Mehta, Sanjay, Liu, Zuoguang, Conti, Richard, Loubet, Nicolas, Frougier, Julien, Greene, Andrew, Yamash
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Year:
2020
DOI:
10.1109/VLSITechnology18217.2020.9265096
File:
PDF, 1.61 MB
2020
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