[IEEE 2020 IEEE Symposium on VLSI Technology - Honolulu, HI, USA (2020.6.16-2020.6.19)] 2020 IEEE Symposium on VLSI Technology - Nanosecond Laser Anneal (NLA) for Si-implanted HfO2 Ferroelectric Memories Integrated in Back-End Of Line (BEOL)
Grenouillet, L., Francois, T., Coignus, J., Kerdiles, S., Vaxelaire, N., Carabasse, C., Mehmood, F., Chevalliez, S., Pellissier, C., Triozon, F., Mazen, F., Rodriguez, G., Magis, T., Havel, V., SlesazYear:
2020
DOI:
10.1109/vlsitechnology18217.2020.9265061
File:
PDF, 1.22 MB
2020