Influences of substrate temperatures on etch rates of...

Applied Surface Science 2021 / 03 Vol. 542

Influences of substrate temperatures on etch rates of PECVD-SiN thin films with a CF4/H2 plasma

Hsiao, Shih-Nan, Nakane, Kazuya, Tsutsumi, Takayoshi, Ishikawa, Kenji, Sekine, Makoto, Hori, Masaru
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Volume:
542
Journal:
Applied Surface Science
DOI:
10.1016/j.apsusc.2020.148550
Date:
March, 2021
File:
PDF, 1.02 MB
2021
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