Effective procedures to achieve a 1 micron CMOS process...

Microelectronic Engineering 1985 Vol. 3; Iss. 1-4

Effective procedures to achieve a 1 micron CMOS process using a step and repeat aligner with autocalibration system

B. Latombe, M. Alaimo, C. Desplat, F. Debaene, J.M. Dumant
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Volume:
3
Year:
1985
Language:
english
Pages:
5
DOI:
10.1016/0167-9317(85)90036-x
File:
PDF, 430 KB
english, 1985
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