The mechanism of ion implantation passivation of PMMA for...

Microelectronic Engineering 1985 Vol. 3; Iss. 1-4

The mechanism of ion implantation passivation of PMMA for lithography with dry etch development

MIJ Beale, C Broughton, A Pidduck, FGH Smith, AG Brown, VGI Deshmukh, TW Janes, SH Mortimer, SJ Till
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Volume:
3
Year:
1985
Language:
english
Pages:
8
DOI:
10.1016/0167-9317(85)90056-5
File:
PDF, 475 KB
english, 1985
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