Investigation on the Neff reverse annealing effect using...

Investigation on the Neff reverse annealing effect using TSC/I-DLTS: Relationship between neutron induced microscopic defects and silicon detector electrical degradations

Z. Li, C.J. Li, V. Eremin, E. Verbitskaya
How much do you like this book?
What’s the quality of the file?
Download the book for quality assessment
What’s the quality of the downloaded files?
Volume:
377
Year:
1996
Language:
english
Pages:
11
DOI:
10.1016/0168-9002(95)01410-1
File:
PDF, 788 KB
english, 1996
Conversion to is in progress
Conversion to is failed