The effect of oxygen on film deposition of a-Si:H by...

Applied Surface Science 1988 Vol. 33-34; Iss. none

The effect of oxygen on film deposition of a-Si:H by tetrode RF sputtering

Yasuo Gekka, Makio Akimoto, Tohru Kita, Yasuto Ohtani, Hiroshi Kezuka
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Volume:
33-34
Year:
1988
Language:
english
Pages:
7
DOI:
10.1016/0169-4332(88)90373-x
File:
PDF, 293 KB
english, 1988
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