Highly conductive p-type microcrystalline SiC:H prepared by...

Applied Surface Science 1988 Vol. 33-34; Iss. none

Highly conductive p-type microcrystalline SiC:H prepared by ECR plasma CVD

Yutaka Hattori, Dusit Kruangam, Toshihiko Toyama, Hiroaki Okamoto, Yoshihiro Hamakawa
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Volume:
33-34
Year:
1988
Language:
english
Pages:
9
DOI:
10.1016/0169-4332(88)90445-x
File:
PDF, 355 KB
english, 1988
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