Adhesion improvements in silicon carbide deposited by plasma enhanced chemical vapour deposition
V.A. Mernagh, T.C. Kelly, M. Ahern, A.D. Kennedy, A.P.M. Adriaansen, P.P.J. Ramaekers, L. McDonnell, R. KoekoekVolume:
49
Year:
1991
Language:
english
Pages:
6
DOI:
10.1016/0257-8972(91)90101-2
File:
PDF, 609 KB
english, 1991