Influence of plasma exposure in the preparation of A1N films by facing-target sputtering
Kikuo Tominaga, Hiroshi Imai, Yasuhiko SueyoshiVolume:
61
Year:
1993
Language:
english
Pages:
5
DOI:
10.1016/0257-8972(93)90223-b
File:
PDF, 540 KB
english, 1993