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In situ characterization of a plasma metalorganic chemical vapour deposition process
F. Richter, S. Peter, R. Pintaske, G. HechtVolume:
68-69
Year:
1994
Language:
english
Pages:
5
DOI:
10.1016/0257-8972(94)90244-5
File:
PDF, 688 KB
english, 1994