Thin metal and SiOx films deposited by the anodic vacuum arc technique
P. Markschläger, G. Kampschulte, M. Eckel, O. MorlokVolume:
74-75
Year:
1995
Language:
english
Pages:
6
DOI:
10.1016/0257-8972(95)08282-4
File:
PDF, 474 KB
english, 1995