ChemInform Abstract: Low Temperature Deposition of AlN Films by an Alternate Supply of Trimethyl Aluminum and Ammonia.
D. RIIHELAE, M. RITALA, R. MATERO, M. LESKELAE, J. JOKINEN, P. HAUSSALOVolume:
28
Year:
1997
Pages:
1
DOI:
10.1002/chin.199705026
File:
PDF, 28 KB
1997