Crystallization of amorphous thin LPCVD Si films: “in situ”...

Materials Science and Engineering: A 1993 Vol. 173; Iss. 1-2

Crystallization of amorphous thin LPCVD Si films: “in situ” TEM measurement of nucleation and grain growth rates

J.P Guillemet, B de Mauduit, B Pieraggi, D Bielle-Daspet, E Scheid
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Volume:
173
Year:
1993
Language:
english
Pages:
4
DOI:
10.1016/0921-5093(93)90248-d
File:
PDF, 575 KB
english, 1993
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