Noise in boron doped amorphous/microcrystallization silicon...

Applied Surface Science 2008 Vol. 254; Iss. 11

Noise in boron doped amorphous/microcrystallization silicon films

Shibin Li, Zhiming Wu, Yadong Jiang, Wei Li, Naiman Liao, Junsheng Yu
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Volume:
254
Year:
2008
Language:
english
Pages:
3
DOI:
10.1016/j.apsusc.2007.11.004
File:
PDF, 361 KB
english, 2008
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