Characterization of the low temperature dopant activation...

Characterization of the low temperature dopant activation behavior at NiSi/silicon interface formed by implant into silicide method

Kow-Ming Chang, Jian-Hong Lin, Cheng-Yen Sun
How much do you like this book?
What’s the quality of the file?
Download the book for quality assessment
What’s the quality of the downloaded files?
Volume:
254
Year:
2008
Language:
english
Pages:
4
DOI:
10.1016/j.apsusc.2008.02.136
File:
PDF, 577 KB
english, 2008
Conversion to is in progress
Conversion to is failed