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Characterization of the low temperature dopant activation behavior at NiSi/silicon interface formed by implant into silicide method
Kow-Ming Chang, Jian-Hong Lin, Cheng-Yen SunVolume:
254
Year:
2008
Language:
english
Pages:
4
DOI:
10.1016/j.apsusc.2008.02.136
File:
PDF, 577 KB
english, 2008