Strain relaxation in SiGe layer during wet oxidation...

Strain relaxation in SiGe layer during wet oxidation process

Yong Zhang, Kunhuang Cai, Cheng Li, Songyan Chen, Hongkai Lai, Junyong Kang
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Volume:
255
Year:
2009
Language:
english
Pages:
5
DOI:
10.1016/j.apsusc.2008.10.022
File:
PDF, 820 KB
english, 2009
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