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ZnTe precipitates formed in SiO2 by sequential implantation of Zn+ and Te+ ions
R. Chemam, J.J. Grob, A. Bouabellou, D. MullerVolume:
113
Year:
2006
Language:
english
Pages:
5
DOI:
10.1016/j.cattod.2005.11.085
File:
PDF, 465 KB
english, 2006