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Use of neural network to model X-ray photoelectron spectroscopy data for diagnosis of plasma etch equipment
Byungwhan Kim, Jeong Kim, Seongjin ChoiVolume:
36
Year:
2009
Language:
english
Pages:
5
DOI:
10.1016/j.eswa.2009.03.004
File:
PDF, 367 KB
english, 2009