ChemInform Abstract: Electrochemical Evidence of a Copper-Induced Etching of n-Type Si in Dilute Hydrofluoric Acid Solutions.
L. F. O. MARTINS, L. SELIGMAN, S. G. SANTOS FILHO, P. C. T. D'AJELLO, C. M. HASENACK, A. A. PASAVolume:
28
Year:
1997
Pages:
1
DOI:
10.1002/chin.199739026
File:
PDF, 27 KB
1997