Low-pressure MOCVD growth of p-type ZnO thin films by using NO as the dopant source
Weizhong Xu, Zhizhen Ye, Ting Zhou, Binghui Zhao, Liping Zhu, Jingyun HuangVolume:
265
Year:
2004
Language:
english
Pages:
4
DOI:
10.1016/j.jcrysgro.2003.12.061
File:
PDF, 196 KB
english, 2004