Atomic vapour deposition (AVD) of SrBi2Ta2O9 using an all...

Journal of Crystal Growth 2004 Vol. 272; Iss. 1-4

Atomic vapour deposition (AVD) of SrBi2Ta2O9 using an all alkoxide precursor

Paul R. Chalker, Richard J. Potter, John L. Roberts, Anthony C. Jones, Lesley M. Smith, Marcus Schumacher
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Volume:
272
Year:
2004
Language:
english
Pages:
7
DOI:
10.1016/j.jcrysgro.2004.08.109
File:
PDF, 229 KB
english, 2004
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