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Dissolution behavior of tetrafluoroethylene-based fluoropolymers for 157-nm resist materials
Takuji Ishikawa, Tesuhiro Kodani, Tomohiro Yoshida, Tsukasa Moriya, Tsuneo Yamashita, Minoru Toriumi, Takayuki Araki, Hirokazu Aoyama, Takuya Hagiwara, Takamitsu Furukawa, Toshiro Itani, Kiyoshi FujiiVolume:
125
Year:
2004
Language:
english
Pages:
9
DOI:
10.1016/j.jfluchem.2004.09.012
File:
PDF, 230 KB
english, 2004