Etching characteristics and plasma-induced damage of...

Microelectronic Engineering 2007 Vol. 84; Iss. 4

Etching characteristics and plasma-induced damage of Ba0.65Sr0.35TiO3 thin films etched in CF4/Ar/O2 plasma

Zuci Quan, Baishun Zhang, Tianjin Zhang, Tao Guo, Ruikun Pan, Juan Jiang
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Volume:
84
Year:
2007
Language:
english
Pages:
7
DOI:
10.1016/j.mee.2006.12.007
File:
PDF, 388 KB
english, 2007
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