Oxygen distribution in nickel silicide films analyzed by...

Micron 2010 Vol. 41; Iss. 5

Oxygen distribution in nickel silicide films analyzed by time-of-flight secondary ion mass spectrometry

Kiyoteru Kobayashi, Hiroaki Watanabe, Kazuyoshi Maekawa, Keiichiro Kashihara, Tadashi Yamaguchi, Koyu Asai, Yukinori Hirose
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Volume:
41
Year:
2010
Language:
english
Pages:
4
DOI:
10.1016/j.micron.2010.02.011
File:
PDF, 497 KB
english, 2010
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