Study on the RF Sputtered hydrogenated amorphous...

Microelectronics Reliability 2005 Vol. 45; Iss. 7-8

Study on the RF Sputtered hydrogenated amorphous silicon–germanium thin films

M. Serényi, J. Betko, Á. Nemcsics, N.Q. Khanh, D.K. Basa, M. Morvic
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Volume:
45
Year:
2005
Language:
english
Pages:
5
DOI:
10.1016/j.microrel.2005.02.008
File:
PDF, 146 KB
english, 2005
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