Erratum to “Adhesion study of low-k/Si system using 4-point...

Materials Science and Engineering: B 2005 Vol. 122; Iss. 3

Erratum to “Adhesion study of low-k/Si system using 4-point bending and nanoscratch test” [Mater. Sci. Eng. B 121 (3) (2005) 193–198]

M. Damayanti, J. Widodo, T. Sritharan, S.G. Mhaisalkar, W. Lu, Z.H. Gan, K.Y. Zeng, L.C. Hsia
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Volume:
122
Year:
2005
Language:
english
DOI:
10.1016/j.mseb.2005.06.013
File:
PDF, 32 KB
english, 2005
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