Controlled localised melting in silicon by high dose...

Controlled localised melting in silicon by high dose germanium implantation and flash lamp annealing

Matthias Voelskow, Wolfgang Skorupa, Jörg Pezoldt, Thomas Kups
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Volume:
267
Year:
2009
Language:
english
Pages:
4
DOI:
10.1016/j.nimb.2009.01.143
File:
PDF, 387 KB
english, 2009
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