Dμ—A new concept in industrial low-energy electron...

Radiation Physics and Chemistry 2010 Vol. 79; Iss. 1

Dμ—A new concept in industrial low-energy electron dosimetry

Jakob Helt-Hansen, Arne Miller, Peter Sharpe, Bengt Laurell, Doug Weiss, Gary Pageau
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Volume:
79
Year:
2010
Language:
english
Pages:
9
DOI:
10.1016/j.radphyschem.2009.09.002
File:
PDF, 354 KB
english, 2010
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