Characterization of high-k gate dielectric and metal gate...

Characterization of high-k gate dielectric and metal gate electrode semiconductor samples with a total reflection X-ray fluorescence spectrometer

Chris M. Sparks, Meredith R. Beebe, Joe Bennett, Brendan Foran, Carolyn Gondran, Alex Hou
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Volume:
59
Year:
2004
Language:
english
Pages:
8
DOI:
10.1016/j.sab.2004.04.009
File:
PDF, 443 KB
english, 2004
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