Tuning of resist slope with hard-baking parameters and release methods of extra hard photoresist for RF MEMS switches
Shimul Chandra Saha, Håkon Sagberg, Erik Poppe, Geir Uri Jensen, Tor A. Fjeldly, Trond SætherVolume:
143
Year:
2008
Language:
english
Pages:
10
DOI:
10.1016/j.sna.2007.10.067
File:
PDF, 1.59 MB
english, 2008