Discharge power dependence of Hα intensity and electron...

Surface and Coatings Technology 2008 Vol. 202; Iss. 22-23

Discharge power dependence of Hα intensity and electron density of Ar + H2 discharges in H-assisted plasma CVD reactor

Jun Umetsu, Kazunori Koga, Kazuhiko Inoue, Hidefumi Matsuzaki, Kosuke Takenaka, Masaharu Shiratani
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Volume:
202
Year:
2008
Language:
english
Pages:
4
DOI:
10.1016/j.surfcoat.2008.06.108
File:
PDF, 891 KB
english, 2008
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