Role of silicon on the growth mechanisms of CNx and SiCN...

Surface and Coatings Technology 2008 Vol. 203; Iss. 3-4

Role of silicon on the growth mechanisms of CNx and SiCN thin films by N2/CH4 microwave plasma assisted chemical vapour deposition

Paul Kouakou, Mohammed Belmahi, Valérie Brien, Virginie Hody, Henri-Noël Migeon, Jamal Bougdira
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Volume:
203
Year:
2008
Language:
english
Pages:
7
DOI:
10.1016/j.surfcoat.2008.09.002
File:
PDF, 1.66 MB
english, 2008
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