Plasma enhanced CVD of fluorocarbon films by low-pressure...

Surface and Coatings Technology 2009 Vol. 203; Iss. 9

Plasma enhanced CVD of fluorocarbon films by low-pressure dielectric barrier discharge

Dongping Liu, Wei Li, Zhiqing Feng, Xiaodong Tan, Baoxiang Chen, Jinhai Niu, Yanhong Liu
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Volume:
203
Year:
2009
Language:
english
Pages:
6
DOI:
10.1016/j.surfcoat.2008.10.023
File:
PDF, 838 KB
english, 2009
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