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High deposition rates of uniform films in tetramethylsilane-based plasmas generated by elementary microwave sources in matrix configuration
L. Latrasse, A. Lacoste, J.C. Sánchez-López, A. Bès, M. Rayar, J. PelletierVolume:
203
Year:
2009
Language:
english
Pages:
7
DOI:
10.1016/j.surfcoat.2009.02.121
File:
PDF, 1.26 MB
english, 2009