First nucleation steps during deposition of SiO2 thin films...

Surface Science 2007 Vol. 601; Iss. 10

First nucleation steps during deposition of SiO2 thin films by plasma enhanced chemical vapour deposition

D. Dudeck, A. Yanguas-Gil, F. Yubero, J. Cotrino, J.P. Espinós, W. de la Cruz, A.R. González-Elipe
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Volume:
601
Year:
2007
Language:
english
Pages:
9
DOI:
10.1016/j.susc.2007.03.027
File:
PDF, 592 KB
english, 2007
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