Formation of highly moisture-resistive SiNx films on Si...

Thin Solid Films 2006 Vol. 501; Iss. 1-2

Formation of highly moisture-resistive SiNx films on Si substrate by Cat-CVD at room temperature

Toshiharu Minamikawa, Akira Heya, Toshikazu Niki, Masahiro Takano, Yasuto Yonezawa, Susumu Muroi, Shigehira Minami, Atsushi Masuda, Hironobu Umemoto, Hideki Matsumura
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Volume:
501
Year:
2006
Language:
english
Pages:
3
DOI:
10.1016/j.tsf.2005.07.173
File:
PDF, 863 KB
english, 2006
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