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Synthesis of novel p-type nanocrystalline silicon from SiH2Cl2 and SiCl4 by rf plasma-enhanced chemical vapor deposition
Yali Li, Yoshie Ikeda, Yasutake Toyoshima, Hajime ShiraiVolume:
506-507
Year:
2006
Language:
english
Pages:
7
DOI:
10.1016/j.tsf.2005.08.023
File:
PDF, 270 KB
english, 2006