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Multi-technique characterization of tantalum oxynitride films prepared by reactive direct current magnetron sputtering
S. Venkataraj, H. Kittur, R. Drese, M. WuttigVolume:
514
Year:
2006
Language:
english
Pages:
9
DOI:
10.1016/j.tsf.2005.08.320
File:
PDF, 808 KB
english, 2006